

The presence of Si +4 enhances SOD1, which stimulates other osteogenic markers downstream and leads to rapid mineral formation. The dissolution rate partially depends on the film chemistry and can be controlled by varying O/N ratio. These materials provide a sustained release of Si +4 in physiological environment for extended times. Amorphous silica solubility and the thermodynamic properties of H4SiO4 in the range of 0 to 350C at Psat. This study reports plasma-enhanced chemical vapor deposition based amorphous silicon oxynitride (Si(ON)x) as a potential new fracture healing biomaterial that adheres well to the implant surface, releases Si +4 to enhance osteogenesis, and forms a surface hydroxyapatite for collagen mineral attachment. Amorphous silica solubility and the thermodynamic properties of H4SiO4 in the range of 0 to 350C at Psat. Yet, no current fixative devices have shown an ability to enhance collagen matrix formation through antioxidant expression. Stimulation of antioxidants such as superoxide dismutase (SOD1), are crucial to reduce ROS, stimulate osteogenesis, and strengthen collagen and mineral formation. Excessive and prolonged ROS activity impedes osteoblast differentiation and instigates long healing times. Such fractures generate a high yield of reactive oxygen species (ROS) that can lead to oxidative stress. Traumatic fractures cause structurally unstable sites due to severe bone loss.
